Exploring the Diverse Applications of 2-Ethyl-4-methylimidazole: Catalyst, Pharmaceutical Intermediate, and Electronic Material Additive

2-Ethyl-4-methylimidazole (2E4MZ) is an important organic compound with the chemical formula C6H10N2 and CAS number 931-36-2. It is a colorless to pale yellow liquid with a distinctive ammonia-like odor. 2-Ethyl-4-methylimidazole finds wide-ranging applications in various fields, and the following is an overview of its primary uses. Firstly, 2-Ethyl-4-methylimidazole is extensively utilized in the chemical industry. It is a crucial catalyst commonly employed as a curing agent for epoxy resins. Epoxy resins are essential high-performance polymers known for their excellent mechan [...]

Enabling Advanced Biodegradation & Environmental Microbiology Research

At Finetech, we are proud to offer high-purity β-Ketoadipate (CAS: 689-31-6), a critical intermediate in the β-ketoadipate pathway—a major route in the microbial degradation of aromatic compounds. As an essential molecule in biodegradation, metabolic engineering, and environmental microbiology, β-Ketoadipate continues to support groundbreaking research across multiple disciplines. 🔬 Product Applications: Microbial degradation pathways of aromatic pollutants Metabolic engineering for biotransformation and synthetic biology Bioremediation research involving [...]

Allylthiourea: A Promising Compound for Scar Reduction and Cosmetic Applications

Introduction:Allylthiourea, also known as allylthiourea or 2-allylthiourea, is a versatile compound with a wide range of applications. In addition to its role as an intermediate in organic synthesis and metal plating, allylthiourea has gained significant attention for its remarkable properties in scar reduction and cosmetic formulations. This article highlights the potential of allylthiourea in addressing skin scars and its incorporation into cosmetic products for improving skin appearance.Scar Reduction: Allylthiourea has shown promising results in scar reduction, particularly in the field o [...]